Gittinger, Moritz and Höflich, Katja and Smirnov, Vladimir and Kollmann, Heiko and Lienau, Christoph and Silies, Martin (2020) Strongly coupled, high-quality plasmonic dimer antennas fabricated using a sketch-and-peel technique. Nanophotonics, 9 (2). pp. 401-412. ISSN 2192-8614

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Abstract

A combination of helium- and gallium-ion beam milling together with a fast and reliable sketch-and-peel technique is used to fabricate gold nanorod dimer antennas with an excellent quality factor and with gap distances of less than 6 nm. The high fabrication quality of the sketch-and-peel technique compared to a conventional ion beam milling technique is proven by polarisation-resolved linear dark-field spectromicroscopy of isolated dimer antennas. We demonstrate a strong coupling of the two antenna arms for both fabrication techniques, with a quality factor of more than 14, close to the theoretical limit, for the sketch-and-peel–produced antennas compared to only 6 for the conventional fabrication process. The obtained results on the strong coupling of the plasmonic dimer antennas are supported by finite-difference time-domain simulations of the light-dimer antenna interaction. The presented fabrication technique enables the rapid fabrication of large-scale plasmonic or dielectric nanostructures arrays and metasurfaces with single-digit nanometer scale milling accuracy.

Item Type: Article
Additional Information: Publiziert mit Hilfe des DFG-geförderten Open Access-Publikationsfonds der Carl von Ossietzky Universität Oldenburg.
Uncontrolled Keywords: helium-ion beam lithography, sketch and peel, plasmonic nanostructures, single-particle dark-field spectroscopy, strong coupling, quality factor, near-field enhancement
Subjects: Science and mathematics > Physics
Divisions: Faculty of Mathematics and Science > Institute of Physics (IfP)
Date Deposited: 20 Mar 2020 11:51
Last Modified: 20 Mar 2020 11:51
URI: https://oops.uni-oldenburg.de/id/eprint/4547
URN: urn:nbn:de:gbv:715-oops-46289
DOI: 10.1515/nanoph-2019-0379
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