Pareek, Devendra and Gonzalez, Marco A. and Zohrabian, Jannik and Sayed, Mohamed H. and Steenhoff, Volker and Lattyak, Colleen and Vehse, Martin and Agert, Carsten and Parisi, Jürgen and Schäfer, Sascha and Gütay, Levent (2018) A vapor-phase-assisted growth route for large-scale uniform deposition of MoS2 monolayer films. RSC Advances, 9 (1). pp. 107-113. ISSN 2046-2069

[img] - Published Version

Volltext (1489Kb)

Abstract

In this work a vapor-phase-assisted approach for the synthesis of monolayer MoS2 is demonstrated, based on the sulfurization of thin MoO3−x precursor films in an H2S atmosphere. We discuss the co-existence of various possible growth mechanisms, involving solid–gas and vapor–gas reactions. Different sequences were applied in order to control the growth mechanism and to obtain monolayer films. These variations include the sample temperature and a time delay for the injection of H2S into the reaction chamber. The optimized combination allows for tuning the process route towards the potentially more favorable vapor–gas reactions, leading to an improved material distribution on the substrate surface. Raman and photoluminescence (PL) spectroscopy confirm the formation of ultrathin MoS2 films on SiO2/Si substrates with a narrow thickness distribution in the monolayer range on length scales of a few millimeters. Best results are achieved in a temperature range of 950–1000 °C showing improved uniformity in terms of Raman and PL line shapes. The obtained films exhibit a PL yield similar to mechanically exfoliated monolayer flakes, demonstrating the high optical quality of the prepared layers.

Item Type: Article
Additional Information: Publiziert mit Hilfe des DFG-geförderten Open Access-Publikationsfonds der Carl von Ossietzky Universität Oldenburg.
Subjects: Science and mathematics > Physics
Divisions: Faculty of Mathematics and Science > Institute of Physics (IfP)
Date Deposited: 18 Mar 2020 09:06
Last Modified: 18 Mar 2020 09:38
URI: https://oops.uni-oldenburg.de/id/eprint/4471
URN: urn:nbn:de:gbv:715-oops-45521
DOI: 10.1039/c8ra08626e
Nutzungslizenz:

Actions (login required)

View Item View Item

Document Downloads

More statistics for this item...